Mechanism of copper chemical vapor deposition from copper dipivaloylmethanate in hydrogen

Mechanism of copper chemical vapor deposition from copper dipivaloylmethanate in hydrogen Научная публикация

Журнал

Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172

Вых. Данные

Год: 2005, Том: 41, Номер: 1, Страницы: 19-23 Страниц : DOI: 10.1007/s10789-005-0064-6

Авторы

Bakovets V. V. ¹ , Levashova T. M. ¹ , Dolgovesova I. P. ¹ , Maksimovskii E. A. ¹

Организации

1	Nikolaev Institute of Inorganic Chemistry, Siberian Division, Russian Academy of Sciences, Novosibirsk, Russia

Bakovets V.V. , Levashova T.M. , Dolgovesova I.P. , Maksimovskii E.A.
Mechanism of copper chemical vapor deposition from copper dipivaloylmethanate in hydrogen
Inorganic Materials. 2005. V.41. N1. P.19-23. DOI: 10.1007/s10789-005-0064-6 OpenAlex

OpenAlex:

W2063574494

БД	Цитирований
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