N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation Научная публикация
| Журнал |
Applied Surface Science
ISSN: 0169-4332 |
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| Вых. Данные | Год: 2021, Том: 566, Номер статьи : 150631, Страниц : 7 DOI: 10.1016/j.apsusc.2021.150631 | ||
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| Организации |
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Реферат:
This article presents the procedure for N – doping of alumina thin film grown on a metal substrate surface. The modification mechanism for model alumina by nitrogen during film formation is studied by in situ X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). The preparation procedure, based on NO treatment of the growing alumina film, allows for nitrogen content control by NO pressure at a substrate temperature of 670 °C. The proposed N – doped model alumina support is suitable for catalysis oriented surface science studies devoted to enhancing supported metal particle resistance to thermal driven sintering.
Библиографическая ссылка:
Dmitrachkov A.M.
, Kvon R.I.
, Nartova A.V.
N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation
Applied Surface Science. 2021. V.566. 150631 :1-7. DOI: 10.1016/j.apsusc.2021.150631 WOS Scopus РИНЦ CAPlus OpenAlex Sciact
N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation
Applied Surface Science. 2021. V.566. 150631 :1-7. DOI: 10.1016/j.apsusc.2021.150631 WOS Scopus РИНЦ CAPlus OpenAlex Sciact
Даты:
| Поступила в редакцию: | 13 мая 2021 г. |
| Принята к публикации: | 11 июл. 2021 г. |
| Опубликована online: | 16 июл. 2021 г. |
| Опубликована в печати: | 15 нояб. 2021 г. |
Идентификаторы БД:
| Web of science: | WOS:000691093600007 |
| Scopus: | 2-s2.0-85111343761 |
| РИНЦ: | 46954334 |
| Chemical Abstracts: | 2021:1607658 |
| OpenAlex: | W3184545221 |
| Sciact: | 44152 |
Цитирование в БД:
| БД | Цитирований |
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| OpenAlex | 9 |