Gas Phase and Surface Reaction Kinetics for CCl4-H2 System in Tubular Chemical Vapour Deposition Reactor - Доклады на конференциях

Gas Phase and Surface Reaction Kinetics for CCl4-H2 System in Tubular Chemical Vapour Deposition Reactor Доклады на конференциях

Язык

Английский

Тип доклада

Стендовый

Конференция

XXI International Conference on Chemical Reactors
22-25 сент. 2014 , Delft

Авторы

Kancharla Sravan K. , Mahajani Sanjay M.

Организации

1	Indian Institute of Technology, Bombay

Number: PP-48 Pages: 246-247

Kancharla S.K. , Mahajani S.M.
Gas Phase and Surface Reaction Kinetics for CCl4-H2 System in Tubular Chemical Vapour Deposition Reactor
XXI International Conference on Chemical Reactors 22-25 Sep 2014